{"id":223,"date":"2025-01-18T13:55:09","date_gmt":"2025-01-18T18:55:09","guid":{"rendered":"https:\/\/pages.charlotte.edu\/hutchens\/?page_id=223"},"modified":"2025-01-18T13:55:09","modified_gmt":"2025-01-18T18:55:09","slug":"facilities-equipment","status":"publish","type":"page","link":"https:\/\/pages.charlotte.edu\/hutchens\/facilities-equipment\/","title":{"rendered":"Facilities &amp; Equipment"},"content":{"rendered":"\n<p><strong>PlasmaTherm RIE-7000 Series Mask Etcher<\/strong><\/p>\n\n\n\n<p>Provides fluorine etching with a broad suite of capabilities, from high rate, high-aspect ratio etching of silicon, high rate etching of dielectrics for microlens and waveguide applications, and very large substrates.<br>Available process gases: Ar, O2, SF6, CHF3, C4F8<\/p>\n\n\n\n<figure class=\"wp-block-image size-large\"><a href=\"https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487.jpg\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"684\" src=\"https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487-1024x684.jpg\" alt=\"\" class=\"wp-image-224\" srcset=\"https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487-1024x684.jpg 1024w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487-300x200.jpg 300w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487-768x513.jpg 768w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487-1536x1026.jpg 1536w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/cleanroom-aaron_cress-7487.jpg 1920w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/a><figcaption class=\"wp-element-caption\">Photo by Aaron Cress<\/figcaption><\/figure>\n\n\n\n<figure class=\"wp-block-image size-large\"><a href=\"https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small.jpg\"><img loading=\"lazy\" decoding=\"async\" width=\"1024\" height=\"768\" src=\"https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small-1024x768.jpg\" alt=\"\" class=\"wp-image-225\" srcset=\"https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small-1024x768.jpg 1024w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small-300x225.jpg 300w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small-768x576.jpg 768w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small-1536x1152.jpg 1536w, https:\/\/pages.charlotte.edu\/hutchens\/wp-content\/uploads\/sites\/1287\/2025\/01\/20240410_101506_small.jpg 2000w\" sizes=\"auto, (max-width: 1024px) 100vw, 1024px\" \/><\/a><\/figure>\n","protected":false},"excerpt":{"rendered":"<p>PlasmaTherm RIE-7000 Series Mask Etcher Provides fluorine etching with a broad suite of capabilities, from high rate, high-aspect ratio etching of silicon, high rate etching of dielectrics for microlens and waveguide applications, and very large substrates.Available process gases: Ar, O2, SF6, CHF3, C4F8<\/p>\n","protected":false},"author":3631,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-223","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/pages\/223","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/users\/3631"}],"replies":[{"embeddable":true,"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/comments?post=223"}],"version-history":[{"count":1,"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/pages\/223\/revisions"}],"predecessor-version":[{"id":227,"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/pages\/223\/revisions\/227"}],"wp:attachment":[{"href":"https:\/\/pages.charlotte.edu\/hutchens\/wp-json\/wp\/v2\/media?parent=223"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}